Exposure apparatus and device manufacturing method

A method of manufacturing a device, the method comprising:

• exposing a substrate to a light using an exposure apparatus;
• developing the exposed substrate;
• and
• processing the developed substrate to manufacture the device,
• wherein the exposure apparatus comprises:
• a projection optical system including an optical element and configured to project a light from an original onto the substrate;
• an adjusting device configured to adjust at least one of a position, an orientation and a shape of the optical element;
• and
• a controller configured to obtain an adjusting amount of the optical element based on a value of an objective function relating to an optical characteristic of the projection optical system, and to control the adjusting device based on the obtained adjusting amount,
• wherein the objective function includes a variable which represents an upper limit of the adjusting amount.