Pattern exposure method, conductive film producing method, and conductive film

A method for producing a conductive film, comprising the steps of

• continuously conveying a strip- or sheet-shaped photosensitive material,
• subjecting the photosensitive material to a proximity exposure through a photomask disposed with a proximity gap of 70 to 200 μm from the photosensitive material, thereby exposing the photosensitive material in a periodic pattern corresponding to a mask pattern of the photomask repeated periodically in the conveying direction, and
• developing the exposed photosensitive material to form a metallic silver portion.

A conductive film comprising a plurality of conductive portions of conductive thin metal wires and a plurality of opening portions, wherein

• a side of the thin metal wire has a protrusion extending toward the opening portion from a virtual line representing a designed width of the thin metal wire, and
• the protruding amount of the protrusion is 1/25 to 1/6 of the designed width.