Methods Of Forming And Using Reticles

A method of forming a reticle and using the reticle for multiple applications, comprising:

• forming the reticle to have multiple patterns tailored for multiple different applications;
• one of the patterns being a first pattern tailored for a first application, and
• another of the patterns being a second pattern tailored for a second application;
• applying masking material across a portion of the reticle to block light from passing through at least part of the second pattern during a first photolithographic process to photolithographically pattern a first substrate;
• removing the masking material after the first photolithographic process;
• and
• after removing the masking material, passing light through an entirety of said second pattern during a second photolithographic process to photolithographically pattern a second substrate.

A method of forming and using a reticle, comprising:

• forming the reticle to have an overall pattern that comprises at least two sub-patterns;
• one of the sub-patterns being a first sub-pattern and the other being a second sub-pattern;
• the reticle having a front side and a backside, and the overall pattern being formed along the front side;
• using the reticle during photolithographic patterning of a first set of semiconductor substrates, the photolithographic patterning using electromagnetic radiation that is passed through both of the first and second sub-patterns;
• forming a mask across a portion of the reticle to block transmission of the electromagnetic radiation through the first sub-pattern;
• and
• while the mask is across the portion of the reticle, using the reticle during photolithographic patterning of a second set of semiconductor substrates.