Lithographic apparatus and device manufacturing method

A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate table, the apparatus comprising:

• a liquid supply system configured to at least partly fill a space between a projection system and the substrate table with liquid;
• a liquid confinement structure arranged to at least partially contain the liquid within the space;
• a substrate table displacement system arranged to move the substrate table along a path relative to the liquid confinement structure, thereby to move the target portion over the surface of the substrate;
• a timetable comprising positions and timings of the substrate displacement system at which the substrate is likely to be undergoing localized cooling;
• and
• a liquid evaporation or condensation controller arranged to control a net rate of energy lost through evaporation or condensation of liquid supplied by the liquid supply system by synchronizing evaporation or condensation controlling techniques with the timetable.