Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorYuichi Iwasaki
Life of this patent
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Abstract
An exposure apparatus (1) configured to expose a pattern of a reticle (20) via a liquid (LW) filled between a final lens of a projection optical system (30) and a substrate (40) includes a stage (45) configured to drive the substrate, a shield (81) configured to enclose the stage so as to form a shield space (SS) around the stage, the shield having an opening for an import or an export of the substrate, and a unit, such as a load lock chamber (83), configured to prevent a vapor of the liquid to going out of the shield space and to reduce an outflow amount of the vapor.
Claims7
An exposure apparatus configured to expose a substrate via a liquid, said exposure apparatus comprising:
- a projection optical system configured to project an image of a pattern of a reticle onto the substrate;
- a stage configured to drive the substrate;
- a liquid supply part configured to supply the liquid to a space between the projection optical system and the substrate;
- a liquid collection part configured to collect the liquid from the space between the projection optical system and the substrate;
- a projection provided to an outer circumference of a liquid supply port of the liquid supply part or a liquid collection port of the liquid supply part, and configured to form a shield space around the liquid in cooperation with the substrate or a leveling plate arranged at an outer circumference of the substrate;
- and
- a collection unit configured to collect a vapor of the liquid from the shield space and to maintain the shield space to have a negative pressure relative to outside of the shield space.
2-3. (canceled)
6-8. (canceled)
Dependencies are inferred from the claim text.