Back to results
US 2010/0244326 A1Published application
Imprint pattern forming method
AssigneeKabushiki Kaisha Toshiba
InventorsHiroshi Tokue, Ikuo Yoneda, Ryoichi Inanami
Life of this patent
Estimating the term…
Abstract
An imprint pattern forming method includes contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern, curing the imprint material filled in the pattern to form an imprint material pattern, and after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.
Claims14
An imprint pattern forming method comprising:
- contacting a template with a pattern in a front surface with an imprint material formed in a substrate to fill the imprint material into the pattern;
- curing the imprint material filled in the pattern to form an imprint material pattern;
- and
- after forming the imprint material pattern, separating the template from the imprint material pattern while applying pressure to the back surface of the template.
1 more element
Dependencies are inferred from the claim text.