Door assembly for substrate processing chamber
AssigneeSTMicroelectronics S.r.l.
InventorJustin Broeker
Life of this patent
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AssigneeSTMicroelectronics S.r.l.
InventorJustin Broeker
Estimating the term…
A substrate processing apparatus includes an enclosure defining a reaction chamber, a substrate holder in the reaction chamber, and a door assembly. The door assembly has a substrate entrance with a tunnel extending to the reaction chamber, a door movable with respect to the substrate entrance, and a pattern of features. The features are located along a portion of the substrate entrance defining the tunnel. The features promote sticking of processing byproducts, produced in the reaction chamber, to the substrate entrance. A door mates with the entrance to form a seal that reduces flow through the tunnel to control the amount of byproducts that enter the tunnel.
A substrate processing apparatus, comprising:
A door assembly for a semiconductor processing apparatus, comprising:
An entrance of a semiconductor processing apparatus, comprising:
A method, comprising:
Dependencies are inferred from the claim text.