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US 2010/0167206 A1Published application
Photoresist composition and method for manufacturing a display substrate using the photoresist composition
AssigneesSamsung Electronics Co., Ltd., AZ Electronic Materials (Japan) K.K.
InventorsWoo-Seok JEON, Sang-Hyun YUN, Hi-Kuk LEE, Deok-Man KANG, Sae-Tae OH
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Abstract
A photoresist composition includes a novolac resin, a benzophenone photosensitizer and an ethylidyne tris phenol photosensitizer, and an organic solvent. Thus, a micropattern having a higher resolution than the resolution of an exposure apparatus is formed to decrease an amount of exposure and/or exposure time, thereby improving manufacturing reliability and productivity.
Claims18
A photoresist composition, comprising:
- a novolac resin;
- a benzophenone photosensitizer and an ethylidyne tris phenol photosensitizer in a weight ratio of the benzophenone photosensitizer to the ethylidyne tris phenol photosensitizer in a range from about 20:80 to about 80:20 based on a total weight of the benzophenone photosensitizer and the ethylidyne tris phenol photosensitizer;
- and
- an organic solvent.
1 more element
A method of manufacturing a display substrate, the method comprising:
- forming a switching element connected to a gate line and a data line;
- forming a transparent electrode layer on a substrate having the switching element;
- forming a photoresist pattern using a photoresist composition comprising:
- a) a novolac resin, b) a benzophenone photosensitizer and an ethylidyne tris phenol photosensitizer in a weight ratio of the benzophenone photosensitizer to the ethylidyne tris phenol photosensitizer in a range from about 20:80 to about 80:20 based on a total weight of the benzophenone photosensitizer and the ethylidyne tris phenol photosensitizer, and c) an organic solvent, the photoresist pattern formed on the transparent electrode layer;
- and
- patterning the transparent electrode layer using the photoresist pattern as an etching mask to form a pixel electrode comprising a plurality of microelectrodes.
3 more elements
Dependencies are inferred from the claim text.