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US 2010/0167203 A1Published application
Resist underlayer composition and method of manufacturing semiconductor integrated circuit device using the same
AssigneeCheil Industries Inc.
InventorsHyeon-Mo Cho, Sang-Kyun Kim, Chang-Soo Woo, Mi-Young Kim, Sang-Ran Koh, Hui-Chan Yun, Woo-Jin Lee, Jong-Seob Kim
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