(Meth)acrylate compound, photosensitive polymer, and resist composition including the same
OwnerSang-Jun Choi, Sung-Jae Lee +1inventors
InventorsSang-Jun Choi, Sung-Jae Lee, Seung-Jib Choi
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Abstract
A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1 wherein, R1 is hydrogen or methyl, R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R4 is a linear ester or cyclic ester group.
Claims17
A (meth)acrylate compound having an acid-labile ester group, the (meth)acrylate compound being represented by the following Chemical Formula 1
- wherein, R1 is hydrogen or methyl,
- R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked to each other to form a cyclic ring or a fused-ring, and
- R4 is a linear ester or cyclic ester group.
A photosensitive polymer, comprising a repeating unit derived from a compound represented by the following Chemical Formula 1:
- wherein, R1 is hydrogen or methyl,
- R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and
- R4 is a linear ester or cyclic ester group.
Dependencies are inferred from the claim text.