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US 2010/0167015 A1Published application
Etching resist
AssigneesNational Institute of Advanced Ind. Sci & Tech, Nitto Denko Corporation
InventorsKazuma Kurihara, Takashi Nakano, Takayuki Shima, Junji Tominaga, Kazuya Fujioka, Ichiro Suehiro
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Abstract
An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor.
Claims7
An etching resist comprising a metallic oxynitride.
Dependencies are inferred from the claim text.