US 2010/0166958 A1 · FABRICATION METHOD AND FABRICATION APPARATUS FOR FABRICATING METAL OXIDE THIN FILM

Abstract

Object To provide a technique for efficiently forming a metal oxide thin film made of zinc oxide or the like on a substrate at a low cost, without requiring a large amount of electrical energy. Means of Solution H2 gas and O2 gas or, H2O2 gas, is introduced into a catalytic reactor to make contact with a catalyst to generate H2O gas, and the H2O gas is jetted from the catalytic reactor to react with a metal compound gas, to thereby deposit a metal oxide thin film on a substrate and fabricate the metal oxide thin film.

Claims20

Dependent claims

A fabrication method for fabricating a metal oxide thin film, comprising:

introducing H2 gas and O2 gas or, H2O2 gas, into a catalytic reactor, to make contact with a catalyst to generate H2O gas;
and
jetting the H2O gas from the catalytic reactor to react with a metal compound gas, to thereby deposit a metal oxide thin film on a substrate.

Dependencies are inferred from the claim text.

Facts

Application

12/600,665Filed 16 May 2008

Priority

JP 2007-13581722 May 2007

Published

1 Jul 2010

Term ends

Not estimatedThe source records don’t support an estimate.

Classification13 codes

C23C 16/40
Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides: oxides
C01G 9/03
Oxides; Hydroxides: processes of production using dry methods, e.g. vapour phase processes
C23C 16/407
Oxides: of zinc, germanium, cadmium, indium, tin, thallium or bismuth
C23C 16/448
Characterised by the method of coating: characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation…

Fabrication method and fabrication apparatus for fabricating metal oxide thin film

Life of this patent

Fabrication method and fabrication apparatus for fabricating metal oxide thin film

Life of this patent

Abstract

Claims20