Exposure apparatus, light source apparatus and method of manufacturing device
AssigneeCanon Kabushiki Kaisha
InventorHiroshi Tanaka
Life of this patent
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Abstract
An apparatus exposes a substrate via a pattern of a reticle using pulsed light generated by a light source, and includes a controller configured to control the light source so that the oscillation frequency of the light source changes periodically while the apparatus exposes the substrate. The oscillation frequency is the number of times of emission of the light source per unit time.
Claims12
An apparatus which exposes a substrate via a pattern of a reticle using a first pulsed light generated by a first light source, the apparatus comprising:
- a controller configured to control the first light source so that an oscillation frequency of the first light source changes periodically while the apparatus exposes the substrate, the oscillation frequency being number of times of emission of the first light source per unit time.
A method comprising:
- exposing a substrate to radiant energy using an apparatus;
- developing the exposed substrate;
- and
- processing the developed substrate to manufacture a device, wherein
- the apparatus
- exposes the substrate via a pattern of a reticle using a first pulsed light generated by a first light source, and
- comprises a controller configured to control the first light source so that an oscillation frequency of the first light source changes periodically while the apparatus exposes the substrate, the oscillation frequency being number of times of emission of the first light source per unit time.
A light source apparatus which supplies a first pulsed light from a first light source and is used in an apparatus that exposes a substrate via a pattern of a reticle, the first light source apparatus comprising:
- a controller configured to control the first light source so that an oscillation frequency of the first light source changes periodically while the apparatus exposes the substrate, the oscillation frequency of the first light source being number of times of emission of the first light source per unit time.
Dependencies are inferred from the claim text.