Method for Fabrication of Liquid Crystal Display
AssigneeDongbu HiTek Co., Ltd.
InventorNam Chil MOON
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Abstract
Disclosed is a method for fabrication of a liquid crystal display with improved optical transmission, which includes sequentially forming a first oxide film, a silicon film, and a second oxide film on a semiconductor substrate, selectively etching the silicon film and the second oxide film to expose the first oxide film, forming a oxynitride film on at least the silicon film, forming a polysilicon layer over the oxynitride film, selectively etching the polysilicon layer to form a top electrode, forming an insulating film on and/or over the substrate, including the top electrode, and forming metal wirings on outer regions of the top electrode.
Claims20
A method for fabrication of a liquid crystal display, comprising:
- forming a first oxide film, a silicon film, and a second oxide film in sequential order, on a semiconductor substrate;
- selectively etching the silicon film and the second oxide film to expose the first oxide film;
- forming an oxynitride film on or over the first oxide film and the silicon film;
- forming a polysilicon layer over the entire oxynitride film;
- selectively etching the polysilicon layer to form a top electrode;
- forming an insulating film on or over the top electrode;
- and
- forming metal wiring on outer regions of the top electrode.
A liquid crystal display, comprising:
- a first oxide film, a silicon film, and a second oxide film in sequential order on a semiconductor substrate, at least the silicon film having an opening therein;
- an oxynitride film in the opening and on or over the first oxide film and the silicon film;
- a polysilicon layer over the oxynitride film;
- an insulating film on or over the polysilicon layer;
- and
- metal wiring on outer regions of the polysilicon layer.
Dependencies are inferred from the claim text.