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AssigneeIndustrial Technology Research Institute
InventorsCHIH-CHEN CHANG, TUNG-CHUAN WU, CHAN-HSING LO, CHING-HUEI WU, MUH-WANG LIANG, FU-CHING TUNG, SHIH-CHIN LIN, JEN-RONG HUANG
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A long linear-type microwave plasma source using a variably-reduced-height rectangular waveguide as the plasma reactor has been developed. Microwave power is fed from the both sides of the waveguide and is coupled into plasma through a long slot cut on the broad side of the waveguide. The reduced height of the waveguide is variable in order to control the coupling between microwave and plasma so that the plasma uniformity can remain a high quality when extending the length of the linear-type plasma source.
A long linear-type microwave plasma source, comprising:
Dependencies are inferred from the claim text.