Imager method and apparatus employing photonic crystals

A micro-electro-mechanical system (MEMS) element for an optoelectronic device, the element comprising:

• a substrate;
• a support structure over the substrate;
• an insulating layer supported by the support structure;
• a plurality of pillars forming a photonic crystal structure on the insulating layer, the pillars being spaced apart from each other;
• and
• a metal layer in contact with at least a portion of the pillars, the support structure configured to be controllable by applied voltages to displace the photonic crystal structure with respect to a surface of the substrate to selectively permit electromagnetic wavelengths to reach the photo-conversion device based upon voltage applied to the metal layer.

A method of forming a micro-electro-mechanical system element for an optoelectronic device, the method comprising the acts of:

• providing a substrate;
• providing a support structure over the substrate;
• forming an insulating layer supported by the support structure;
• forming a layer of a photonic crystal material over the insulating layer;
• patterning the photonic crystal material layer to form a plurality of pillars forming a photonic crystal structure, the pillars formed spaced apart from each other and each having a height and a horizontal cross-sectional shape;
• and
• forming a metal layer in contact with at least a portion of the pillars, the support structure configured to be controllable to displace the photonic crystal structure with respect to a surface of the substrate to selectively permit electromagnetic wavelengths to reach the photo-conversion device based upon a voltage applied to the metal layer.