Manufacturing method of electro line for liquid crystal display device
AssigneeLG Display Co., Ltd.
InventorsOh-Nam KWON, Kyoung-Mook LEE, Heung-Lyul CHO, Seung-Hee NAM, Cyoo-Chul JO
Life of this patent
Estimating the term…
Abstract
A manufacturing method of an electro line for a liquid crystal display device includes depositing a barrier layer made of a conducting material on a substrate, depositing a copper layer (Cu) on the barrier layer, wet-etching the Cu layer using a first etchant, and dry-etching the barrier layer using a second etchant using the wet-etched Cu layer as an etch mask.
Claims34
1-16. (canceled)
A liquid crystal display device including an electro line made by the process of:
- depositing a molybdenum (Mo) layer on a substrate;
- depositing a copper (Cu) layer on the Mo layer;
- and
- subsequently patterning the Cu layer and the Mo layer by an etchant including base materials and an additive, the base materials including an oxidizing agent and an acid, the additive lowering a potential difference between the Mo layer and the Cu layer.
An thin film transistor for a liquid crystal display device, comprising:
- a substrate;
- a gate electrode on the substrate, the gate electrode including a first barrier layer and a first copper (Cu) layer;
- a gate insulator on the gate electrode;
- an active layer on the gate insulator;
- an ohmic contact layer on the active layer;
- source and drain electrodes on the ohmic contact layer.
A manufacturing method of a thin film transistor for a liquid crystal display device, comprising:
- forming a first metal layer on a substrate;
- forming a second metal layer on the first metal layer;
- and
- patterning the first metal layer and the second metal layer by an etchant including base materials and an additive, the base materials including an oxidizing agent, an acid
(canceled)
(canceled)
(canceled)
(canceled)
(canceled)
(canceled)
(canceled)
(canceled)
Dependencies are inferred from the claim text.