Structure formation using metal deposited on a rie-able seedlayer

A method for fabricating a coil structure of a magnetic head, comprising:

• providing a substrate comprising a Reactive Ion Etching (RIE) stop layer, an oxide layer formed on the RIE stop layer, and a Reactive Ion Etchable (RIE-able) layer formed on the oxide layer;
• patterning a resist layer on the RIE-able layer;
• forming a metal layer on portions of the RIE-able layer that are not covered by the resist layer via electrodeposition;
• removing the resist layer, wherein removing the resist layer exposes a portion of the RIE-able layer;
• performing RIE to remove exposed portions of the RIE-able layer and portions of the oxide layer beneath the exposed portions of the RIE-able layer;
• removing the metal layer;
• and
• depositing a metal in an opening in the oxide layer formed during the RIE, wherein the metal deposited in the opening in the oxide layer forms the coil.

A method for fabricating a magnetic pole of a magnetic head, comprising:

• providing a substrate comprising a Reactive Ion Etching (RIE) stop layer, an oxide layer formed on the RIE stop layer, and a Reactive Ion Etchable (RIE-able) layer formed on the oxide layer;
• patterning a resist layer on the RIE-able layer;
• forming a metal layer on portions of the RIE-able layer that are not covered by the resist layer via electrodeposition;
• removing the resist layer, wherein removing the resist layer exposes a portion of the RIE-able layer;
• performing RIE to remove exposed portions of the RIE-able layer and portions of the oxide layer beneath the exposed portions of the RIE-able layer;
• removing the metal layer;
• and
• depositing a magnetic material in an opening in the oxide layer formed during the RIE, wherein the magnetic material deposited in the opening in the oxide layer forms the magnetic pole.