Method for manufacturing CPP-type magnetoresistance effect element
AssigneeTDK Corporation
InventorsToshiyuki Ayukawa, Shinji Hara, Daisuke Miyauchi, Takahiko Machita, Yoshihiro Tsuchiya
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AssigneeTDK Corporation
InventorsToshiyuki Ayukawa, Shinji Hara, Daisuke Miyauchi, Takahiko Machita, Yoshihiro Tsuchiya
Estimating the term…
A method for manufacturing a thin film magnetic head includes a step for forming an MR layered body; a step for forming a first sacrificial layer made of material removable by wet etching, and subsequently, forming a cap layer on the upper surface of the first sacrificial layer; further, a step for patterning the MR layered body and the cap layer and then filling part of the removed areas of the MR layered body and the cap layer with a bias magnetic layer and the remaining with insulating layers; a step for removing the cap layer by dry etching and, subsequently, removing the first sacrificial layer by wet etching; and a step for forming a second shield layer above the MR layered body and the bias magnetic layer.
A method for manufacturing a thin film magnetic head which comprises:
Dependencies are inferred from the claim text.