Multivariable solver for optical proximity correction
AssigneeBrion Technology, Inc.
InventorsWilliam S. Wong, Been-Der Chen, Yenwen Lu, Jiangwei Li, Tatsuo Nishibe
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Abstract
The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout.
Claims32
A computer-implemented method comprising:
- determining, by the computer, a difference resist image value for a plurality of edge segments in a mask layout due to one or more perturbations applied to the plurality of edge segments;
- creating, by the computer, a multisolver matrix that includes the difference resist image values for all of the plurality of edge segments;
- simultaneously determining, by the computer, a correction delta value for each of the plurality of edge segments in the mask layout using the multisolver matrix.
A computer program product comprising a computer storage medium for storing instructions for performing:
- determining a difference resist image value for a plurality of edge segments in a mask layout due to one or more perturbations applied to the plurality of edge segments;
- creating a multisolver matrix that includes the difference resist image values for all of the plurality of edge segments;
- simultaneously determining a correction delta value for each of the plurality of edge segments in the mask layout using the multisolver matrix.
A system that generates mask image data for a mask layout that includes edge segments, the system comprising a computer adapted to determine locations of the edge segments by:
- determining a difference resist image value for a plurality of edge segments in a mask layout due to one or more perturbations applied to the plurality of edge segments;
- creating a multisolver matrix that includes the difference resist image values for all of the plurality of edge segments;
- simultaneously determining a correction delta value for each of the plurality of edge segments in the mask layout using the multisolver matrix.
A method of manufacturing a mask comprising:
- generating mask layout that includes edge segments whose locations have been determined by:
- determining a difference resist image value for a plurality of the edge segments in a mask layout due to one or more perturbations applied to the plurality of the edge segments;
- creating a multisolver matrix that includes the difference resist image values for all of the plurality of the edge segments;
- and
- simultaneously determining a correction delta value for each of the plurality of the edge segments in the mask layout using the multisolver matrix;
- and
- producing a mask using the generated mask layout data.
Dependencies are inferred from the claim text.