Methods for producing an antireflection surface on an optical element, optical element and associated optical arrangement

Abstract

Methods for producing an antireflection surface (6) on an optical element (1) made of a material that is transparent at a useful-light wavelength λ in the UV region, preferably at 193 nm. A first method includes: applying a layer (3) of an inorganic, non-metallic material, which forms nanostructures (4) and is transparent to the useful-light wavelength λ, onto a surface (2) of the optical element (1); and etching the surface (2) while using the nanostructures (4) of the layer (3) as an etching mask for forming preferably pyramid-shaped or conical sub-lambda structures (5) in the surface (2). In a second method, the sub-lambda structures are produced without using an etching mask. An associated optical element (1) includes such an antireflection surface (6), and an associated optical arrangement includes such an optical element (1).

Dependencies are inferred from the claim text.