Actuator System, Lithographic Apparatus, Method of Controlling the Position of a Component and Device Manufacturing Method

An actuator system configured to move a component relative to a base of the

• actuator system, comprising:
• first and second actuating elements, each having a first end connected to the base and a second end connected to the component, the first actuating element comprising first and second sections of material that are joined to each other with both sections extending from the first end to the second end of the actuating element, and the second actuating element comprising third and fourth sections of material that are joined to each other with both sections extending from the first end to the second end of the actuating element;
• and
• at least one power supply, configured to provide heat to the first and second actuating elements, the at least one power supply controlling the heat provided to the first actuating element independently from the heat provided to the second actuating element,
• wherein:
• the component is set apart from the base in a first direction;
• the coefficient of thermal expansion of the first section of material is different from that of the second section of material;
• the coefficient of thermal expansion of the third section of material is different from that of the fourth section of material;
• and
• the first and second actuating elements are each configured such that, if the temperature of the actuating element increases from a nominal working temperature, the actuating element applies a force to the component to be actuated that is parallel to a second direction, perpendicular to the first direction, such that the force applied by the first actuating element when its temperature increases is in an opposite direction to the force applied by the second actuating element when its temperature increases.

A method of manufacturing a device, comprising:

• conditioning a beam of radiation using a radiation beam conditioning system;
• patterning the conditioned beam of radiation;
• projecting the patterned beam of radiation into a substrate using a projection system;
• controlling the position of at least one optical component of the radiation beam conditioning system or the projection system using an actuator system configured to move the optical component relative to a base of the actuator system that is set apart from the optical component in a first direction, wherein:
• the actuator system comprises first and second actuating elements, each having a first end connected to the base and a second end connected to the optical component, the first actuating element comprising first and second sections of material that are joined to each other with both sections extending from the first end to the second end of the actuating element, and the second actuating element comprising third and fourth sections of material that are joined to each other with both extending from the first end to the second end of the actuating element;
• the coefficient of thermal expansion of the first section of material is different from that of the second section of material;
• the coefficient of thermal expansion of the third section of material is different from that of the fourth section of material;
• and
• the first and second actuating elements are each configured such that, if the temperature of the actuating element increases from a nominal working temperature, the actuating element applies a force to the optical component to be actuated that is parallel to a second direction, perpendicular to the first direction, and such that the force applied by the first actuating element when its temperature increases is in an opposite direction to the force applied by the second actuating element when its temperature increases;
• and
• providing heat to the first and second actuating elements in order to actuate the actuator system, wherein the heat may be provided to the first actuating element independently from the heat provided to the second actuating element.