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AssigneeASML Netherlands B.V.
InventorsNicolaas Rudolf KEMPER, Robertus Nicodemus Jacobus Van Ballegoij, Marcus Martinus Petrus Adrianus Vermeulen, Michel Riepen, Martinus Wilhelmus Van Den Heuvel, Paul Petrus Joannes Berkvens, Christophe De Metsenaere, Jimmy Matheus Wilhelmus Van De Winkel, Cornelius Maria Rops
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An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
A fluid extraction system to extract a two-phase fluid in a lithographic apparatus, the fluid extraction system comprising:
A method of reducing a pressure fluctuation of an immersion liquid in an immersion lithographic apparatus, the method comprising:
A fluid extraction system to extract a two-phase fluid in a lithographic apparatus, the fluid extraction system comprising:
A method of reducing a pressure fluctuation of an immersion liquid used in an immersion lithographic apparatus, the method comprising:
Dependencies are inferred from the claim text.