Chamber shield for vacuum physical vapor deposition
AssigneeFUJIFILM Corporation
InventorsYouming Li, Jeffrey Birkmeyer
Life of this patent
Estimating the term…
Abstract
A physical vapor deposition apparatus includes a vacuum chamber with side walls, a cathode, a radio frequency power supply, a substrate support, and anode, and a shield. The cathode is inside the vacuum chamber and includes a sputtering target. The radio frequency power supply is configured to apply power to the cathode. The substrate support is inside and electrically isolated from the side walls of the vacuum chamber. The anode is inside and electrically connected to the side walls of the vacuum chamber. The shield is inside and electrically connected to the side walls of the vacuum chamber and includes an annular body and a plurality of concentric annular projections extending from the annular body.
Claims25
A physical vapor deposition apparatus comprising:
- a vacuum chamber having side walls;
- a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target;
- a radio frequency power supply configured to apply power to the cathode;
- a substrate support inside and electrically isolated from the side walls of the vacuum chamber;
- an anode inside and electrically connected to the side walls of the vacuum chamber;
- and
- a shield inside and electrically connected to the side walls of the vacuum chamber, wherein the shield comprises an annular body and a plurality of concentric annular projections extending from the annular body.
A physical vapor deposition apparatus comprising:
- a vacuum chamber having side walls;
- a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target;
- a radio frequency power supply configured to apply power to the cathode;
- a substrate support inside and electrically isolated from the side walls of the vacuum chamber;
- an anode inside and electrically connected to the side walls of the vacuum chamber;
- a first shield inside and electrically connected to the side walls of the vacuum chamber;
- and
- a second shield electrically connected to the side walls of the vacuum chamber and positioned between the side walls of the chamber and the first shield, wherein a height of the second shield is at least as great as a height of the first shield.
Dependencies are inferred from the claim text.