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AssigneeTokyo Electron Limited
InventorsNorihiro Ito, Satoshi Kaneko, Hiromitsu Nanba
Estimating the term…
A liquid treatment device having a substrate holding section (2) for horizontally holding a wafer (W) and capable of rotating with the wafer (W), a rotation cup (4) having an annular shape so as to surround the wafer (W) held by the substrate holding section (2) and capable of rotating with the wafer (W), a rotation mechanism (3) for integrally rotating the rotation cup (4) and the substrate holding section (2), a nozzle (5) for supplying a treatment liquid for the wafer (W) and a cleaning liquid for the rotation cup (4), a liquid supply section (85) for supplying the treatment liquid and cleaning liquid to the nozzle (5), and a nozzle movement mechanism for moving the nozzle (5) between a first position at which the liquid is discharged to the wafer (W) and a second position at which the liquid is discharged to an external portion of the rotation cup (4). The wafer (W) is treated with the liquid with the nozzle (5) positioned at the wafer treatment position, and the cleaning liquid is discharged to the external portion of the rotation cup with the nozzle (5) positioned at the rotation cup cleaning position.
A liquid processing apparatus comprising:
A liquid processing apparatus comprising:
A liquid processing method for performing a liquid process on a substrate in a liquid processing apparatus that comprises a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state, a rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate, a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member, and a liquid delivery nozzle configured to deliver a process liquid for performing the liquid process on the substrate and a cleaning liquid, the method comprising:
A storage medium that stores a program for execution on a computer, which is used for a liquid processing apparatus that comprises a substrate holding member configured to rotate along with a substrate held thereon in a horizontal state, a rotary cup configured to surround the substrate held on the substrate holding member and to rotate along with the substrate, a rotation mechanism configured to integrally rotate the rotary cup and the substrate holding member, and a liquid delivery nozzle configured to deliver a process liquid for performing a liquid process on the substrate and a cleaning liquid, wherein the program, when executed, causes the computer to control liquid processing apparatus to conduct a liquid processing method comprising:
Dependencies are inferred from the claim text.