Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin

A resist composition for immersion exposure comprising:

• a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid;
• an acid-generator component (B) which generates acid upon exposure;
• a fluorine-containing resin component (F);
• and
• an organic solvent (S), the base component (A), the acid-generator component (B) and the fluorine-containing resin component (F) being dissolved in the organic solvent (S),
• the fluorine-containing resin component (F) comprising a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) represented by general formula (f3-1) shown below:
• wherein R represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms;
• Y1 represents an aliphatic cyclic group;
• Z represents a tertiary alkyl group-containing group or an alkoxyalkyl group;
• a represents an integer of 1 to 3, and b represents an integer of 0 to 2, with the provision that a+b=1 to 3;
• and each of c, d and e independently represents an integer of 0 to 3.