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US 2010/0143587 A1Published application
Vapor deposition apparatus and vapor deposition method
AssigneeSamsung Display Co., Ltd.
InventorsJoo-Hyeon Lee, Jin-Koo Chung, Sung-Soo Lee
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Abstract
A vapor deposition apparatus includes a linear head including a plurality of nozzles, and an angle controller controlling an inclined angle of the linear head. The angle of inclination of the linear head can be varied so as to position different portions of the linear head at different distances from the surface of a substrate.
Claims14
A vapor deposition apparatus comprising:
- a linear head including a plurality of nozzles;
- and
- an angle controller controlling an angle of inclination of the linear head.
A vapor deposition method in a vapor deposition apparatus including a linear head having a plurality of nozzles, comprising:
- measuring a deposition speed corresponding to at least two positions along the linear head;
- controlling an angle of inclination of the linear head according to the measured deposition speeds;
- and
- executing a deposition process with the angled linear head.
1 more element
Dependencies are inferred from the claim text.