US 2010/0141147 A1 · CAPACITIVELY COUPLED PLASMA (CCP) GENERATOR WITH TWO INPUT PORTS

Abstract

A capacitively coupled plasma (CCP) generator with two input ports, which is especially used as a large-area capacitively coupled plasma (CCP) generator. In the inventive CCP generator, only a RF power supply is required to provide the two input ports with RF power. The input impedance at each of the input ports is adjustable so that the standing wave between two rectangular electrodes can be eliminated to achieve plasma uniformity.

Claims11

Dependent claims

A capacitively coupled plasma generator, comprising:

a first input port, being coupled to a rectangular electrode;
a first input port, being coupled to a rectangular electrode;
a second input port, being coupled to the rectangular electrode;
a first impedance modulator, being coupled to the first input port;
a second impedance modulator, being coupled to the second input port;
an impedance matching circuit, being coupled to the first impedance modulator and the second impedance modulator, respectively;
and
an RF power supply, being coupled to the impedance matching circuit.

5 more elements

Dependencies are inferred from the claim text.

Facts

Application

12/425,154Filed 16 Apr 2009

Priority

TW 0971477559 Dec 2008

Published

10 Jun 2010

Term ends

Not estimatedThe source records don’t support an estimate.

Classification5 codes

H05H 1/46
Generating plasma: using applied electromagnetic fields, e.g. high frequency or microwave energy
H01J 37/32091
Radio frequency generated discharge: the radio frequency energy being capacitively coupled to the plasma
H01J 37/32174
Radio frequency generated discharge: circuits specially adapted for controlling the RF discharge
H05H
Plasma technique

Capacitively coupled plasma (ccp) generator with two input ports

Life of this patent

Capacitively coupled plasma (ccp) generator with two input ports

Life of this patent

Abstract

Claims11