Imprint lithography
AssigneeASML Netherlands B.V.
InventorsAleksey Yurievich KOLESNYCHENKO, Helmar Van Santen, Yvonne Kruijt-Stegeman
Life of this patent
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Abstract
A method for manufacturing a working template for use in imprint lithography is disclosed, which in an embodiment, involves contacting a first target region of an imprintable medium on a working template substrate with a master template to form a first imprint in the medium, the imprint defining a part of a working template pattern, separating the master template from the imprinted medium, contacting a second target region of the medium with the master template to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and separating the master template from the imprinted medium.
Claims21
1-44. (canceled)
A working template manufacturing apparatus, comprising:
- a substrate holder configured to hold a working template substrate having a imprintable medium thereon;
- and
- a template holder configured to cause a master template supported by the template holder to contact the imprintable medium to form a first imprint in the medium, the first imprint defining a part of a working template pattern, to cause the master template to contact the imprintable medium to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and to cause the master template to separate from the imprinted medium, wherein the working template pattern is configured to imprint a pattern on a device substrate.
A working template manufacturing apparatus, comprising:
- a substrate holder configured to hold a working template substrate having a imprintable medium thereon;
- a template holder configured to cause a master template supported by the template holder to contact the imprintable medium to form a first imprint in the medium, the first imprint comprising a first pattern feature and a first area of reduced thickness and defining a part of a working template pattern, to cause the master template to contact the imprintable medium to form a second imprint in the medium, the second imprint comprising a second pattern feature and a second area of reduced thickness and defining a further part of the working template pattern, and to cause the master template to separate from the imprinted medium;
- and
- an etching apparatus configured to etch the first and second areas of reduced thickness to expose regions of the working template substrate and to etch the exposed regions of the working template substrate to form the working template pattern in the working template substrate to define a working template configured to imprint a pattern on a device substrate.
A manufacturing apparatus, comprising:
- a substrate holder configured to hold a working template substrate having a imprintable medium thereon;
- and
- a template holder configured to cause a master template supported by the template holder to contact the imprintable medium to form a first imprint in the medium, the first imprint defining a part of a working template pattern, to cause the master template to contact the imprintable medium to form a second imprint in the medium, the second imprint defining a further part of the working template pattern, and to cause the working template to contact a second imprintable medium on a device substrate to form an imprint in the second medium corresponding to the working template pattern.
Dependencies are inferred from the claim text.