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US 2010/0136794 A1Published application
Method for removing etching residues from semiconductor components
AssigneeBASF SE
InventorsBerthold Ferstl, Andreas Kuehner
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Abstract
A method for cleaning structured surfaces of semiconductor components to remove photoresist and etching residues after the etching of the surface, comprising: a) treatment of the surface with an acidic aqueous solution comprising one or more acids and one or more oxidizing agents, b) removal of the photoresist and c) washing with demineralized water in the stated sequence.
Claims8
A method for cleaning the structured surfaces of semiconductor components to remove photoresist and etching residues after the etching of the surface, comprising:
- a) treating the surface with an acidic aqueous solution comprising one or more acids and one or more oxidizing agents,
- b) removing the photoresist and
- c) washing with demineralized water
- in the stated sequence.
1 more element
Dependencies are inferred from the claim text.