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US 2010/0136484 A1Published application
Photosensitive paste and sintered layer
AssigneeE.I. du Pont de Nemours and Company
InventorsKazushige Ito, Masakatsu Kuroki
Life of this patent
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Abstract
Disclosed is a photosensitive paste including glass frit; organic binder; polymerizable monomer; photopolymerization initiator; and organic solvent, wherein at least a part of the polymerizable monomer contains phosphorus atom within the structure.
Claims12
A photosensitive paste, comprising glass frit;
- organic binder;
- polymerizable monomer;
- photopolymerization initiator;
- and organic solvent, wherein at least a part of the polymerizable monomer contains phosphorus atom within the structure.
1 more element
A method for manufacturing a pattern of electric device, comprising steps of:
- coating a photosensitive paste, comprising glass frit;
- organic binder;
- polymerizable monomer;
- photopolymerization initiator;
- and organic solvent, wherein at least a part of the polymerizable monomer contains phosphorus atom within the structure;
- drying the coated paste;
- exposing the coated paste to selectively proceed the polymerization;
- developing the coated paste to form a pattern;
- and
- firing the resultant pattern.
7 more elements
Dependencies are inferred from the claim text.