Reflective mask blank and method of producing the same, and method of producing a reflective mask
AssigneeHoya Corporation
InventorMorio HOSOYA
Life of this patent
Estimating the term…
Abstract
A reflective mask blank has a substrate, a multilayer reflective film formed on the substrate to reflect exposure light, a protective film formed on the multilayer reflective film, and an absorber film formed on the protective film to absorb the exposure light. The protective film is made of an Ru compound containing Ru and X (X being at least one kind of material selected from Nb and Zr). The protective film has an oxidized surface layer containing X as a main component. A reflective mask is obtained by forming a transfer pattern by patterning the absorber film of the reflective mask blank.
Claims14
A reflective mask blank comprising a substrate, a multilayer reflective film formed on the substrate to reflect exposure light, a protective film formed on the multilayer reflective film to protect the multilayer reflective film, and an absorber film formed on the protective film to absorb the exposure light, wherein:
- the protective film is made of a ruthenium compound containing ruthenium (Ru) and X (X being at least one kind of material selected from niobium (Nb) and zirconium (Zr)) and has an oxidized surface layer containing X as a main component.
Dependencies are inferred from the claim text.