Apparatus and method to control vacuum at porous material using multiple porous materials
AssigneeNikon Corporation
InventorsAlex Ka Tim POON, Leonard Wai Fung KHO, Derek COON, Gaurav KESWANI
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AssigneeNikon Corporation
InventorsAlex Ka Tim POON, Leonard Wai Fung KHO, Derek COON, Gaurav KESWANI
Estimating the term…
An immersion liquid confinement apparatus recovers an immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system. The apparatus includes a confinement member that includes an outlet and an aperture through which a patterned image is projected onto the object. A first liquid-permeable member covers the outlet and has a first surface that faces the object and a second surface opposite the first surface, the second surface contacting a first chamber. A second liquid-permeable member has first and second oppositely-facing surfaces, the first surface of the second liquid-permeable member contacts the first chamber, the second surface of the second liquid-permeable member contacts a second chamber that is different from the first chamber. A hydrophobic porous member is provided between the first chamber and a vacuum system that supplies a low pressure to the first chamber.
An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system, the apparatus also recovering the immersion liquid from the immersion area, the apparatus comprising:
An immersion liquid confinement apparatus for confining an immersion liquid in an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system, the apparatus also recovering the immersion liquid from the immersion area, the apparatus comprising:
An immersion lithography apparatus comprising:
A method of recovering immersion liquid from an immersion area that includes a gap between a projection system and an object of exposure in an immersion lithography system, the method comprising:
Dependencies are inferred from the claim text.