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AssigneeNikon Corporation
InventorsHiroyuki Nagasaka, Kenichi Shiraishi, Soichi Owa, Shigeru Hirukawa
Estimating the term…
An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
A lithographic projection apparatus, comprising:
A reflective member for positioning under a projection system of an immersion lithographic projection apparatus, the reflective member comprising:
A reflective member sized for positioning in a recess for a substrate of a substrate table of an immersion lithographic apparatus.
A method of irradiating the underside of a liquid supply system positioned around an end of a projection system in an immersion lithographic apparatus, the method comprising:
A method of cleaning the underside of a liquid supply system comprising providing liquid consisting of ultra-pure water and one of (a) a mixture of hydrogen peroxide and ozone, (b) hydrogen peroxide at a concentration of up to 5%, (c) ozone at a concentration of up to 50 ppm, and (d) oxygen at concentration of up to 10 ppm to the underside and irradiating the underside by reflecting a cleaning beam of radiation projected through a projection system from a reflector onto the underside.
Dependencies are inferred from the claim text.