Semiconductor device and method of manufacturing semiconductor integrated circuit chip
AssigneeFujitsu Microelectronics Limited
InventorsAkio Hara, Toyoji Sawada, Tsuyoshi Koyashiki, Hironori Fukaya
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AssigneeFujitsu Microelectronics Limited
InventorsAkio Hara, Toyoji Sawada, Tsuyoshi Koyashiki, Hironori Fukaya
Estimating the term…
A semiconductor device including a plurality of circuit regions formed in a semiconductor substrate and a scribe region formed around the circuit regions for separating the respective circuit regions, the scribe region having a plurality of laminated interlayer films including a plurality of metal films and an optically-transparent insulation film formed between and on the plurality of metal films, wherein a first metal film included in a first upper interlayer film of the plurality of interlayer films is positionally offset in a vertical direction to a second metal film included in a second lower interlayer film under the first interlayer film.
A semiconductor device comprising:
A method of manufacturing a semiconductor chip, comprising a step of radiating a laser beam to a first metal film and a second metal film at the same time and exploding the first and second metal films in a semiconductor substrate;
Dependencies are inferred from the claim text.