Plasma Processing Apparatus

A plasma processing apparatus comprising:

• a plasma processing main frame comprising:
• a vacuum process chamber;
• an exhaust device evacuating the vacuum process chamber;
• a mass flow controller supplying a process gas into the vacuum process chamber;
• a stage electrode receiving a workpiece in the vacuum process chamber and holding it by adsorption;
• a high-frequency electrical source applying a high-frequency electrical power to the supplied process gas to generate plasma;
• a transfer device placing the workpiece on the stage electrode and taking out the workpiece after it is processed;
• and
• an apparatus controller controlling the plasma processing main frame in accordance with a predetermined procedure;
• wherein the apparatus controller comprises a diagnosis device which acquires a plurality of recipes, one of the plurality of recipes corresponding to the workpiece and being applied for processing of the workpiece, and wherein apparatus parameters of the plasma processing apparatus are acquired when a specific recipe of the plurality of recipes is executed, the diagnosis device diagnosing whether the condition of the plasma processing main frame is good or not based on the acquired apparatus parameters;
• wherein the specific recipe is a recipe having at least one process condition different from a process condition under which normal operation is performed;
• wherein the at least one process condition of the specific recipe is a process for supplying a predetermined amount of a gas into the vacuum process chamber via the mass flow controller and setting an exhaust speed of the exhaust device so that the pressure inside the process chamber becomes close to a full scale level of a pressure gage;
• wherein the setting of the exhaust speed of the exhaust device includes controlling an opening amount of an exhaust value of the exhaust device;
• and
• wherein the diagnosis device compares an ultimate value of the gas pressure inside the vacuum process chamber as measured by the close to the full scale level of the pressure gage based upon the predetermined amount of the gas supplied with a registered value of the pressure gage to diagnose whether the condition of the plasma processing main frame is good or not.