Application device for applying fluid to a substrate, comprising valve devices which are arranged in a row and are each equipped with an application valve nozzle for emitting the fluid under pressure and with associated valve actuating device for controlling the emission of fluid by closing and opening the application valve nozzles, and comprising a common distributing fluid chamber which can be subjected to pressure from the fluid and which connects the application valve devices to each other for admission of the fluid, the distributing fluid chamber being provided with a fluid intake duct which is arranged in such a way that the fluid which is under pressure in the distributing fluid chamber is distributed along the row of application valve devices to the latter, characterised in that at least one cleaning valve device which is incorporated into the row of application valve devices for connection to the distributing fluid chamber and is fitted with a cleaning valve nozzle and with associated valve actuating device for closing and opening the cleaning valve nozzle, is associated with at least the one fluid intake duct of the distributing fluid chamber, a flow path which is effective when the cleaning valve nozzle is open, for cleaning the common distributing fluid chamber, being formed in the distributing fluid chamber between the fluid intake duct (110) and the at least one associated cleaning valve device.