Method of manufacturing film bulk acoustic resonator using internal stress of metallic film and resonator manufactured thereby

A method of manufacturing a film bulk acoustic resonator, comprising:

• laminating a first layer on an upper surface of a semiconductor substrate;
• removing a predetermined area from the first layer for electric contact between a signal line of the semiconductor substrate and a lower electrode layer;
• forming the lower electrode layer by depositing a first metal film on an upper surface of the first layer, wherein the predetermined area has been removed, and by patterning the first metal film based on a shape of the first layer;
• forming a piezoelectric layer by depositing a piezoelectric material on an upper surface of the lower electrode layer and by patterning the piezoelectric material based on a shape of the lower electrode layer;
• and
• forming an upper electrode layer by depositing a second metal film on an upper surface of the piezoelectric layer and by patterning the second metal film based on a shape of the piezoelectric layer, wherein at least one of a deposition pressure and a deposition power is controlled to generate a predetermined amount of upward stress when depositing the first metal film for the lower electrode.