Spinous process spacer implant and technique

A method for creating and maintaining a desired space between adjacent spinous processes, the method comprising:

• surgically exposing the adjacent spinous processes;
• elevating the adjacent spinous processes to create a space therebetween;
• placing a spinous process spacer device between the adjacent spinal processes;
• and
• positioning a pair of notches of the device such that portions of the adjacent spinous processes are engaged therewithin to maintain the size of the desired space between the adjacent spinous processes.

A method for creating and maintaining a desired space between adjacent spinous processes, the method comprising:

• surgically exposing the adjacent spinous processes from a lateral aspect;
• placing a spinous process spacer device between the adjacent spinal processes such that a longitudinal axis of a tubular member of the device is oriented at a transverse angle with respect to the spine;
• rotating the device within the mid-sagittal plane such that the longitudinal axis of the tubular member is substantially parallel to the spine;
• and
• positioning a pair of notches of the device such that portions of the adjacent spinous processes are engaged therewithin to maintain the size of the desired space between the adjacent spinous processes.

A method for stabilizing adjacent spinous processes, the method comprising:

• accessing an interspinous space from a lateral aspect thereof to expose the adjacent spinous processes;
• passing the spinous process spacer device laterally into the interspinous space between the adjacent spinous processes;
• orienting the device such that a longitudinal axis of the device is substantially parallel to the spine;
• and
• engaging opposing notches of the device with respective portions of the adjacent spinous processes to maintain the size of the desired space between the adjacent spinous processes.