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US 2010/0075257 A1Published application
Resin and Chemically Amplified Resist Composition Comprising the Same
AssigneeSumitomo Chemical Company, Limited
InventorsIchiki TAKEMOTO, Nobuo ANDO
Life of this patent
Estimating the term…
Abstract
A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.
Claims14
A resin comprising a structural unit represented by the formula (I):
- wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O—, —NH—, —S—, —CO— or —CO—O—, Rc represents a C1-C6 alkyl group, X1 represents —O—CO—, —CO—O—, —CO—OCH2—, —CH2—O—CO—, —O—CH2—, —CH2—O—, —NRd—CO— or —CO—NRd—, Rd represents a hydrogen atom or a C1-C6 alkyl group, and A+ represents an organic counter ion.
A process for producing a resin comprising a structural unit represented by the formula (I):
- wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O—, —NH—, —S—, —NRc—, —CO— or —CO—O—, Rc represents a C1-C6 alkyl group, X1 represents —O—CO—, —CO—O—, —CO—OCH2—, —O—CH2— or —NRd—CO—, Rd represents a hydrogen atom or a C1-C6 alkyl group, and A+ represents an organic counter ion, which comprises reacting a the resin comprising a structural unit represented by the formula (IV):
- with a salt represented by the formula (V):
- wherein Q1, Q2, X1, U and A+ are the same meanings as defined above, and L represents a halogen atom, a C1-C12 alkylsulfonyloxy group, a C6-C12 arylsulfonyloxy group or a C5-C12 heteroarylsulfonyloxy group.
Dependencies are inferred from the claim text.