Self-assembly of block copolymers on topographically patterned polymeric substrates

A method of forming a nanopatterned surface, comprising:

• forming a block copolymer film on a topographically patterned surface of a polymer layer;
• wherein the topographically patterned surface of the polymer layer is formed in contact with a topographically patterned crystalline surface;
• and
• annealing the block copolymer film to form an annealed block copolymer film comprising a nanopatterned surface.

A layered article, comprising:

• a single crystal substrate comprising a topographically patterned surface;
• wherein the topographically patterned surface is a planar surface at least one degree removed from any crystallographic plane of the single crystal substrate;
• and
• a polymer layer comprising a topographically patterned surface in contact with the topographically patterned surface of the single crystal substrate.

A layered article, comprising:

• a polymer layer comprising a topographically patterned surface formed in contact with a topographically patterned surface of a single crystal substrate;
• wherein the topographically patterned surface of the single crystal substrate is a substantially planar surface at least one degree removed from any crystallographic plane of the single crystal substrate;
• and
• a block copolymer film comprising a surface in contact with the patterned surface of the polymer layer.