Apparatus and Method for Improved Control of Heating and Cooling of Substrates
AssigneeApplied Materials, Inc.
InventorsBlake R. Koelmel, Norman L. Tam, Joseph M. Ranish
Life of this patent
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Abstract
Methods and apparatus for processing substrates and controlling the heating and cooling of substrates are described. A radiation source providing radiation in a first range of wavelengths heats the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature rang. A filter prevents at least a portion of radiation within the second wavelength range from reaching the substrate.
Claims23
An apparatus for heating a substrate, comprising:
- a heat source to provide radiation in a first range of wavelengths and to heat the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature range;
- a process area including a substrate support to support the substrate;
- and
- a filter disposed between the substrate support and the heat source to filter radiation from the heat source so that at least a portion of the radiation within the second range of wavelengths is not absorbed by the substrate.
A method for processing a substrate in a rapid thermal processing chamber, comprising:
- rapidly heating the substrate with a heating source producing radiation in a first range of wavelengths within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature range;
- and
- filtering radiation from the heating source so that at least a portion of the radiation within the second range of wavelengths is not absorbed by the substrate.
Dependencies are inferred from the claim text.