Photosensitive composition, partition walls and black matrix
AssigneeAsahi Glass Company, Limited
InventorsHideyuki Takahashi, Kenji Ishizeki
Life of this patent
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AssigneeAsahi Glass Company, Limited
InventorsHideyuki Takahashi, Kenji Ishizeki
Estimating the term…
To provide a photosensitive composition with which it is possible to form partition walls (black matrix) having excellent light shielding properties and liquid repellency. A photosensitive composition, which comprises a polymer (A) having a side chain containing a fluorine atom-containing group or a silicon atom-containing group and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is an O-acyloxime compound, and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %.
A photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the following formula (1) or a group represented by the following formula (2) and a side chain containing an ethylenic double bond in one molecule, a black colorant (B), a photopolymerization initiator (C) which is a compound represented by the following formula (3), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond in one molecule, wherein the proportion of the black colorant (B) in the total solid content of the composition is from 15 to 60 mass %:
Dependencies are inferred from the claim text.