Patterning method

A patterning method for forming a pattern by transferring a concavo-convex pattern formed on a first template in a resist agent applied on an underlying film formed on a substrate, the patterning method comprising:

• forming the underlying film on the substrate;
• acquiring information about a surface state of the underlying film;
• applying the resist agent on the substrate on which the underlying film is formed;
• determining, based on the surface state, whether irregularity or foreign matter is present in a shot region on which a pattern is to be formed by using the first template after the applying the resist agent;
• forming a pattern corresponding to the concavo-convex pattern formed on the first template by solidifying the resist agent while the first template is brought close to the underlying film on the shot region at a certain distance with the resist agent therebetween when it is determined, at the determining, that no irregularity or foreign matter is present in the shot region;
• and
• solidifying the resist agent while a second template different from the first template is brought close to the underlying film on the shot region at a certain distance with the resist agent therebetween when it is determined, at the determining, that irregularity or foreign matter is present in the shot region.