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US 2010/0064273 A1Published application
Method for Compensating for Variations in Structures of an Integrated Circuit
AssigneeInternational Business Machines Corporation
InventorsSanto Credendino, Michael D. Hulvey, Jothimalar Kuppusamy, Robert Kenneth Leidy, Paul William Pastel, Bruce Walter Porth, Anthony K. Stamper
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Abstract
A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.
Claims22
A method, comprising:
- (a) selecting a mask design shape and selecting a region of said mask design shape;
- (b) applying a model-based optical proximity correction to all of said mask design shape;
- and
- after (b), (c) applying a rules-based optical proximity correction to said selected region of said mask design shape.
1 more element
A method, comprising:
- (a) selecting a mask design shape and selecting a regions of said mask design shape, said mask design shape comprising a spine and two or more fingers extending perpendicularly from said spine, said selected regions consisting of regions of each of said fingers that are proximate to said spine;
- (b) applying a model-based optical proximity correction to all of said mask design shape;
- and
- after (b), (c) applying a rules-based optical proximity correction to said selected region of said mask design shape.
1 more element
Dependencies are inferred from the claim text.