Conductive member manufacturing method, and electron source manufacturing method using the same

A manufacturing method of manufacturing at least plural conductive members in a first direction, each of the plural conductive members having plural first lines parallelly extending in the first direction and a second line extending in a second direction perpendicular to the first direction and connecting the plural first lines, and a width of the first line taken along the second direction being larger than a width of the second line taken along the first direction, the manufacturing method comprising:

• a film forming step of forming a conductive film on a substrate;
• a step of applying a negative photosensitive resin on the conductive film;
• a first exposing step of exposing the negative photosensitive resin by using a first mask which has plural aperture portions, respectively extending in the first direction, at pitches same as those of the first lines;
• a second exposing step of exposing the negative photosensitive resin by using a second mask which has aperture portions, each extending in the second direction in a width same as a maximum length of the conductive member taken along the first direction, at pitches same as those of the conductive members in the first direction;
• a step of forming a first resist by developing the negative photosensitive resin double-exposed;
• a step of forming a first conductive film pattern by etching the conductive film with use of the first resist as a mask;
• a step of applying a negative photosensitive resin on the substrate after the etching;
• a step of forming a second resist by exposing and developing the negative photosensitive resin in a state that the second mask is being shifted toward the first direction;
• and
• a step of forming a second conductive film pattern by etching the first conductive film pattern with use of the second resist as a mask.