Method of regulating the titration of a solution, device for controlling said regulation and system comprising such a device
AssigneesL'air Liquide Societe Anonyme A Directoire Et Conseil De Surveillance Pour L'etude Et, I'Exploitation des...
InventorsHervé E. DULPHY, Christophe MARTIN
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Abstract
Method for regulating the titration of a solution, in which a predetermined amount of a product contained in the solution is added to the solution according to a time interval, called the addition interval, which is proportional to the product of the time degradation coefficient D of the product in solution and the total volume Vt of the solution at the time of the addition.
Claims8
A process for polishing semiconductor substrates comprising:
- a) providing said semiconductor substrates;
- b) preparing a solution, wherein a method of regulating a titration of said solution comprises adding a predetermined amount of a product to the solution according to an addition interval, wherein said addition interval is a time interval proportional to a product of a time degradation coefficient D of said product in solution and a total volume Vt of the solution at a time of the addition;
- and
- c) polishing said semiconductor substrates with said solution.
A device for controlling the regulation of a titration of a solution, comprising:
- a) a product;
- and
- b) a means for controlling an injection of a predetermined amount of said product into said solution according to an addition interval, wherein the addition interval is a time interval proportional to a product of a time degradation coefficient D of said product in solution and a total volume Vt of the solution at the time of the addition.
A system for producing a solution, comprising:
- a) a system for regulating a titration of a solution, which comprises a device comprising:
- i) a product, and
- ii) a means for controlling an injection of a predetermined amount of said product into said solution according to an addition interval, wherein the addition interval is a time interval proportional to a product of a time degradation coefficient D of said product in solution and a total volume Vt of the solution at the time of the addition;
- and
- b) a means for delivering said solution.
A system for producing semiconductor substrates, comprising:
- a) a unit for polishing said substrates, and
- b) a system for producing a chemical polishing solution, comprising a system for regulating a titration of said solution, which comprises a device comprising:
- i) a product, and
- ii) a means for controlling an injection of a predetermined amount of said product into said solution according to an addition interval, wherein the addition interval is a time interval proportional to a product of a time degradation coefficient D of said product in solution and a total volume Vt of the solution at the time of the addition.
Dependencies are inferred from the claim text.