Method of manufacturing stack-type semiconductor device and method of manufacturing stack-type electronic component
AssigneeKabushiki Kaisha Toshiba
InventorsAtsushi Yoshimura, Tadanobu Ookubo
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AssigneeKabushiki Kaisha Toshiba
InventorsAtsushi Yoshimura, Tadanobu Ookubo
Estimating the term…
A first semiconductor element is bonded on a substrate. A complex film formed of integrated dicing film and adhesive film is affixed on a rear surface of a semiconductor wafer which is to be second semiconductor elements, the dicing film having a thickness within a range of not less than 50 μm nor more than 140 μm and a room temperature elastic modulus within a range of not less than 30 MPa nor more than 120 MPa, and the adhesive film having a thickness of 30 μm or more and a room temperature elastic modulus before curing within a range of not less than 500 MPa nor more than 1200 MPa. The semiconductor wafer together with the adhesive film is divided into the second semiconductor elements. The second semiconductor element is picked up from the dicing film to be bonded on the first semiconductor element.
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A method of manufacturing a stack-type semiconductor device, comprising:
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Dependencies are inferred from the claim text.