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OwnerGo Noya, Masakazu Kobayashi +2inventors
InventorsGo Noya, Masakazu Kobayashi, Yasushi Akiyama, Katsutoshi Kuramoto
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The present invention provides a composition for forming a top anti-reflection coating and also provides a pattern formation method employing that composition. The composition prevents pattern failures caused by light reflected in the resist layer in the exposure step, and it further avoids troubles caused by residues produced in the etching step. The composition contains a solvent and fine particles having a mean particle size of 1 to 100 nm. In the pattern formation method of the present invention, a top anti-reflection coating is formed from the composition. The composition and the method according to the present invention can be used to form a composite film composed of a resist layer and a top anti-reflection coating.
A composition for forming a top anti-reflection coating, comprising fine particles having a mean particle size of 1 to 100 nm and a solvent.
A pattern formation method comprising the steps of:
A composite film comprising a resist layer and a top anti-reflection coating with which the top surface of said resist layer is covered, wherein said top anti-reflection coating contains fine particles having a mean particle size of 1 to 100 nm in an amount of 60 to 100 wt. % based on the total weight of said top anti-reflection coating.
Dependencies are inferred from the claim text.