Exposure appartus, exposure method and method of manufacturing display panel substrate

An exposure apparatus, comprising:

• a chuck supporting a substrate coated with a photoresist;
• a stage moving the chuck;
• and
• a light beam irradiation device comprising a spatial light modulator modulating a light beam, a driving circuit driving the spatial light modulator according to drawing data, and an irradiation optical system emitting the light beam modulated by the spatial light modulator,
• wherein the stage moves the chuck, the substrate is scanned multiple times by a light beam irradiated from the light beam irradiation device to draw patterns on the substrate, the exposure apparatus being characterized by:
• a position detecting means detecting a position of the chuck moved by the stage;
• a traveling error detecting means detecting traveling error of the stage according to a detecting result of the position detecting means;
• a means modifying a coordinate of the drawing data supplied to the driving circuit of the light beam irradiation device according to a detecting result of the traveling error detecting means and supplying the drawing data with the modified coordinate to the driving circuit of the light beam irradiation device.